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Equipment
Name:
Raith50 E-beam Writer
Equipment Type:
Description:
- Beam spot 4 nm at 30 KV and 10 pA.
- LASER-interferometer controlled stage with 2 nm positioning resolution over 45 mm by 45 mm travel range and 4 inch wafer handling capability.
- Lithography specifications:
- Writing field from 0.5 um to 2000 um.
- Minimum feature size of 50 nm.
- Minimum grating periodicity of 160 nm.
- Stitching and Overlay accuracy of 80 nm (mean + 2 sigma).
Location
| Denton Desk IV Sputter Coater | HTG Mask Aligner | Raith50 E-beam Writer | |||||