Three cathode (one RF, two DC) sputter system. Capable of RF bias for pre-deposition cleaning and descum. Stage can heat up to 450°C. Nano3 supplies a wide variety of sputter targets for use in this system. Cathode 1 is used primarily for RF Sputtering. RF Target sputtering will be Run in the “Manual Mode”. Cathodes 2 & 3 are used for DC Deposition. DC Target deposition will be run in the “Auto Mode” using the Auto Deposition function. Ar – Gas1 Slot O2 - Gas2 Slot