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Equipment
Name:
Vistec EBPG 5200
Equipment Type:
Description:
- High-resolution Gaussian Beam System
- Thermal Field Emission source with 50/100kV beam energy
- Minimum feature size <8nm
- Write field size up to 1mm; stitching <30nm (mean + 3 sigma)
- Sample holders: 2”, 3”, 4”, 8” wafers and pieces, 6” mask
Please visit http://nano3.calit2.net/ebeamlitho for more information.
Location
| Vistec EBPG 5200 | |||||||
| Filmetrics F20 (2) | Zeiss Axio Imager Optical Microscope | ||||||