The AJA DC sputter deposition tool may be used for deposition of a variety of metals (incl. magnetic materials) and other conductive materials. Samples up to four inches in diameter can be accommodated. The system is equipped with a load lock and 3 DC magnetrons arranged in a \"sputter-up\" configuration. Base pressures in the low 10-9 torr range can be attained. Substrates can be heated up to 800ºC, and RF biasing can be employed for pre-cleaning or for film microstructure control during deposition.