The Nano3 facility includes two labs outside the cleanroom. These labs house various types of analytical equipment that does not require a class 100 or class 1000 environment. Nano3 users that only need access to the analytical labs can do an abbreviated safety orientation which does not include the cleanroom procedures.

The equipment currently available for use in these rooms includes the following:

• Phillips XL30 Field Emission ESEM with Oxford EDS Attachment
  • Image resolution to 7nm
  • Beam energy range from 0.5KV to 30KV
  • Low vacuum mode allows imaging of nonconductive surfaces and biological samples
  • Solid state backscattered electron detector compliments the standard Everhart-Thornley secondary electron detector
  • Quantomix Wet Cell capsules allow imaging of liquid samples
  • STEM in SEM sample holder available for 30KV STEM imaging


• Veeco Scanning Probe Microscope - Multimode microscope with Nanoscope IV controller. The MultiMode performs a full range of SPM techniques for surface characterization of properties like topography, elasticity, electrical and magnetic fields:
  • Tapping Mode
  • Contact Mode AFM
  • Phase Imaging
  • Magnetic Force Microscopy (MFM)
  • Scanning Tunneling Microscopy (STM)
  • Electric Force Microscopy (EFM)
  • Surface Potential Microscopy
    • 10 µm x 10 µm non-magnetic scanner with 2.5µm vertical range.
    • 125 µm x 125 µm non-magnetic scanner with 5µm vertical range.


• Horiba X-Ray Fluorescence Microscope
• Determine elemental composition in air (no vacuum required)
• Accomodates larger sample sizes


• Hewlett Packard B1500A Semiconductor Device Analyzer and Probe Station
• Employs four source/monitor units (SMUs), two voltage source units (VSUs) and two voltage measurement units (VMUs) for measuring and analyzing semiconductor device characteristics.
• Performs very wide variety of analytical tests on a range of devices for IV and CV data