Welcome to the Nano3 facility at Calit2.

Nano3 provides advanced capabilities for fabrication and characterization in a state-of-the-art cleanroom opened in May 2006.

The name Nano3 reflects the synergetic nature of the facility, focusing on three fields of nanoscale research and development within the space - Nanoscience, Nanoengineering and Nanomedicine.

In addition to providing essential nanofabrication capabilities for research on electronic and optoelectronic materials and devices, the facility is intended to facilitate the pursuit of research in emerging, interdisciplinary, and rapidly growing fields such as biomedical and biochemical devices, heterogeneous integrated devices and circuits, and sensor technology.

Nano3 is pleased to announce that our new, state-of-the-art Electron-Beam Lithography System (Vistec EBPG5200) is now installed and operational. This new major capability is offered as a service to our academic and industry user community.

Specifications of our Vistec EBPG5200 system include:

• High-resolution Gaussian Beam System
• Thermal Field Emission source with 50/100kV beam energy
• Minimum feature size <8nm
• Write field size up to 1mm; stitching <30nm (mean + 3σ)
• Sample holders: 2”, 3”, 4”, 6”, 8" wafers and pieces, 6” mask
• 50 MHz pattern generator
• Z Lift (Adjustable Stage Height) option

For more details, please contact nano3ebeam@calit2.net or Dr. Maribel Montero (858-534-4222).

Nano3 offers a variety of short courses which provide training for some of the basic micro and nanofabrication techniques possible in Nano3. These courses provide a starting point for users interested in accomplishing a variety of processing goals.

The training sessions will be scheduled based on demand. Please visit Nano3 Training Courses for more information.

Please remember that before you can sign up for any of these trainings you must complete all Nano3 access requirements.